Graphene Lithography Based on Laser Reduction and Plasma Oxidization for Rewritable Hologram Imaging

Abstract Graphene lithography is crucial for various graphene‐based devices, showing considerable potential in the fields of energy, environment, electronics, and optics. Recent reports show that graphene can be facilely fabricated simultaneously patterned without masks via laser direct writing on a oxide (GO) film. Thus, this laser‐reduced (LRGO) successfully applied holograms with advantages being ultra‐thin, wide‐angle viewing, full‐color display. However, owing to absence an effective approach oxidizing LRGO, are only written once, not rewritable. This study demonstrates LRGO oxidized oxygen plasma treatment, enabling development rewritable through reduction oxidization. Laser irradiation directly reduce GO achieve patterning. The treatment gradually oxidizes removes as‐prepared LRGO. Using computer‐calculated hologram pattern, system manufacture thin seconds. image erased preparing film new writing. facile, low‐cost, erasable process paves way applications metasurfaces, device fabrication, imaging, data storage, displays.